LAMICHHANE, S. K. Thermal Induced Clustering of Polysilicon Film on Silicon Nitride/Silicon Dioxide Bed on Silicon Substrate. Scientific World, [S. l.], v. 8, n. 8, p. 10–14, 2010. DOI: 10.3126/sw.v8i8.3839. Disponível em: https://nepjol.info/index.php/SW/article/view/3839. Acesso em: 22 nov. 2024.