1.
Adhikari GP, Limbu HK. Damage Formation and Calculation of Energy Loss during Implantation of Antimony and Boron Ion in Silicon Target. J. Nep. Phys. Soc. [Internet]. 2019 Dec. 29 [cited 2024 Nov. 23];5(1):103-10. Available from: https://nepjol.info/index.php/JNPhysSoc/article/view/26939